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Microstructure and luminescence dynamics of ZnCdO films with high Cd content deposited on different substrates by DC magnetron sputtering method

机译:直流磁控溅射法在不同基底上沉积高Cd含量ZnCdO薄膜的微结构和发光动力学

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摘要

Investigation of Cd behavior in the ZnCdO alloys, where Cd content exceeds the solubility limit, is of importance due to possible impurity segregation and second phases' formation in this material. We have studied the Cd behavior in the Zn1-xCdxO films deposited by dc magnetron sputtering on different substrates: c-plane Al2O3, bare Si (1 0 0) and Au (45 nm)/Si (1 0 0). It is revealed that Cd content of 10 at. % in the target results in average 6-8 at. % of Cd in the films, depending on the substrate type. Structural analysis based on X-ray diffraction revealed the absence of Cd-related secondary phases. Time-resolved photoluminescence (TRPL) and high-resolution energy dispersive X-ray analysis (EDX) help to understand the recombination dynamics of spontaneous emission and to establish correlations between cadmium content and radiative lifetime. We have revealed that the internal quantum efficiency is influenced by the Cd content and defect concentration. It is suggested that increasing of the cadmium content results in the reduction of nonradiative recombination centers originating from point defects.
机译:Cd含量超过溶解度极限的ZnCdO合金中Cd行为的研究非常重要,因为这种材料中可能存在杂质偏析和第二相的形成。我们已经研究了通过直流磁控溅射在不同衬底上沉积的Zn1-xCdxO膜中的Cd行为:c平面Al2O3,裸Si(1 0 0)和Au(45 nm)/ Si(1 0 0)。据透露,镉的含量为10 at。目标中的%结果平均为6-8 at。薄膜中Cd的百分比,取决于基材类型。基于X射线衍射的结构分析表明不存在Cd相关的第二相。时间分辨光致发光(TRPL)和高分辨率能量色散X射线分析(EDX)有助于了解自发发射的复合动力学,并建立镉含量与辐射寿命之间的相关性。我们已经揭示了内部量子效率受Cd含量和缺陷浓度的影响。建议增加镉含量导致减少源自点缺陷的非辐射复合中心。

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